专利内容由知识产权出版社提供
专利名称：EVAPORATION SYSTEM WITH
MEASUREMENT UNIT
发明人：Uwe HOFFMANN申请号：US15286270申请日：20161005
公开号：US20170066010A1公开日：20170309
专利附图：
摘要：An evaporator for evaporating a material onto a substrate is described. Theevaporator includes a guiding means for guiding the material towards at least oneopening nozzle. The guiding means includes a measurement outlet for a portion of the
material. The evaporator further includes a first measurement system configured forgenerating a first signal correlated with a deposition rate of the evaporator and having afirst detector positioned for being coated by the material and a second optical
measurement system for generating a second signal correlated with the deposition rateof the evaporator and wherein the second signal is based on the portion of the materialof the measurement outlet.
申请人：Applied Materials, Inc.
地址：Santa Clara CA US
国籍：US
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